Monografie
Precursor chemistry of tantalum and niobium nitride for MOCVD and ALD applications
- Language
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Englisch
- Notes
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Bochum, Univ., Diss., 2006
- Identifier
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982633009
Subject
Beschichtung; Beschichtungsanlage; Hochschulschrift
Contributor
- URN
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
26.01.2023, 1:57 PM CET
Object type
- Monografie
Associated
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